Magnetic force assisted thermal nanoimprint lithography (MF-TNIL) for cost-effective fabrication of 2D nanosquare array
نویسندگان
چکیده
منابع مشابه
Electrostatic force-assisted nanoimprint lithography (EFAN).
We present and demonstrate a novel imprint method, electrostatic force-assisted nanoimprint lithography (EFAN), where a voltage applied between a mold and a substrate generates an electrostatic force that presses the mold into a resist on the substrate. We have successfully used EFAN to pattern nanostructures in a photocurable resist spin-coated on a wafer, with high fidelity and excellent unif...
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Nanoimprint lithography (NIL) is a compelling technique for low cost nanoscale device fabrication. The precise and repeatable replication of nanoscale patterns from a single high resolution patterning step makes the NIL technique much more versatile than other expensive techniques such as e-beam or even helium ion beam lithography. Furthermore, the use of mechanical deformation during the NIL p...
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Nanoimprint lithography (NIL) is a promising nanomanufacturing technology that offers an alternative to traditional photolithography for manufacturing next-generation semiconductor devices. This technology involves coating an ultraviolet (UV)-curable monomer layer on the substrate and then imprinting it with a template containing topography corresponding to the desired substrate features. While...
متن کاملFabrication of nanocontacts for molecular devices using nanoimprint lithography
We present a simple process to fabricate gold nanocontacts with a gap as small as sub-10 nm. This method uses a two-step process of nanoimprint lithography ~NIL! and electromigration. First, 20 nm wide gold nanowires were fabricated by NIL on a silicon dioxide substrate. Then by passing an electric current through a nanowire, the nanowire is split into two wires with a gap as small as sub-10 nm...
متن کاملFabrication of flexible mold for hybrid nanoimprint-soft lithography
0167-9317/$ see front matter 2011 Elsevier B.V. A doi:10.1016/j.mee.2010.12.107 ⇑ Corresponding author. E-mail address: [email protected] (J We fabricated molds consisting of features in rigid UV-cured resist on an elastic poly(dimethylsiloxane) (PDMS) support for hybrid nanoimprint-soft lithography. The molds were duplicated through coating and curing a UV-curable resist onto a pol...
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ژورنال
عنوان ژورنال: Nano Express
سال: 2020
ISSN: 2632-959X
DOI: 10.1088/2632-959x/ab934d